SIMS : Secondary Ion Mass Spectrometry (dynamic method, allowing in-depth profiles).
TOF-SIMS : Time-of-Flight Secondary Ion Mass Spectrometry (static method, which analyses in the first molecular layers on the surface).
XPS-AUGER : Analysis of the elements and chemical bonds in the first atomic and molecular layers on the surface.
Applications:
Semi-conductor technology, surface treatment, corrosion case analysis, adhesion, molecular contamination,…
* Not under the scope of ISO 17025 accreditation.
The SIMS depth profiles of the alloy elements show an enrichment in chromium oxide (Cr and O) in the passivation layer (5 nm thickness) of a Cr-Ni steel.
